As well as light sources for visible light, OSRAM supports a complete assortment of special lamps and systems in ultraviolet and infrared radiation. UV and IR radiation is used for various technical applications.
In today's society, tailor-made UV radiation is state of the art technology. It sterilises Water and surfaces, hardens paints, adhesives and plastics, exposes printing plates and helps recognise forgeries, decayed foods and hairline cracks in work pieces. Last, but not least, UV radiation can be used very effectively for advertising purposes and for special effect illumination in theatres, discos and bars.
In many industries, be it in production, processing or finishing, infrared radiation has become an important heat source. It is very efficient, can be controlled quickly and precisely, and puts minimum strain on the materials involved. It is indispensable in modern ovens and grills, as well as in commercial hot counters. It is also used successfully for alternative room heating by warming persons and objects and not the ambiance. Infrared radiation has a positive influence on well-being.
OSRAM PURITEC Systems and HNS Lamps are mercury low pressure lamps which mainly emit short wave UV radiation. They are the advanced and environment-friendly alternative to chemical methods.
UV Application technics
This high performance halogen metal vapour lamp was developed specifically for industrial applications. A particular combination of metal halides generates strong radiation in the UVB range (280-315 nm) and especially in the UVA range (315-380 nm). The quartz bulb absorbs UV radiation below 250 nm. This means that no ozone is generated.
UV Application cosmetics
Sunlight and warmth have numerous positive effects on human health and comfort. Heat irradiation causes instantaneous vessel expansion. Circulation and therefore oxygen supply are improved. Painful muscle tensions are relieved.
IR Heat Radiation
Heating by Radiation: The electromagnetic oscillations - the heat radiation - produced by an infrared lamp are transferred to the product to be heated without contact and without an intermediate medium. Heating is achieved much quicker than with convection because part of the radiation enters the interior of the product directly, in addition to heating its surface.
Highest efficiency for wafer cleaning, glass cleaning, surface activation and ozone production.
For further information, please contact our specialists.